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Applications
Perfluorinated gases are used in a number of different process steps.
| 1. | PFCs are used as etching gases for plasma etching. The gases etch the submicron patterns on metal and dielectric layers of advanced integrated circuits. In addition, SF6 decomposed by the plasma allows the etching chambers to be cleaned. |
| 2. | The fluorinated compounds are also used to accurately perform a rapid chemical cleaning of Chemical Vapor Deposition (CVD) tool chambers. When the silicon and silicon based dielectric layers are being applied, a deposit remains in the CVD chamber. To ensure that the wafers do not become contaminated by these deposits, the chambers are cleaned at defined intervals, avoiding frequent mechanical wet cleanings. |
| 3. | In the wafer testing process stage, SF6 is used as insulator for power device testing. Power device are used for automotive applications to simulate the real device working conditions which are essential to prove semiconductor device reliability. The SF6 reuse concept can allow SF6 to be used in an environmentally friendly manner and to be kept in a closed cycle. |